专利名称：Method of calibrating beam position in
charged-particle beam system
发明人：Kazuya Goto申请号：US12351276申请日：20090109公开号：US08193511B2公开日：20120605
专利附图：
摘要：A method of calibrating the beam position in a charged-particle beam systemstarts with finding a focus deviation on the material surface for each point within adeflection field. A focus correction voltage Vnecessary to cancel out the focus deviation is
determined. A beam position deviation fper unit focus correction voltage is found. Thedeflection voltage is corrected so as to cancel out the product f·V. The deflection voltageis corrected so as to cancel out the sum of the product f·Vand the measured deflectionfield distortion while correcting the focus based on the voltage V.
申请人：Kazuya Goto
地址：Tokyo JP
国籍：JP
代理机构：The Webb Law Firm
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