Process for the obtention of a pattern, especially

专利名称：Process for the obtention of a pattern,

especially from a ferromagnetic materialhaving flanks with different steepnesses, andmagnetic head with such a pattern

发明人：SIBUET, HENRI申请号：EP88402075.1申请日：19880810公开号：EP0304373B1公开日：19940608

摘要：This process consists in depositing a photosensitive resin layer (6) on a

ferromagnetic layer (4) resting on a ceramic base (2); in photolithoetching an opening (8)in this resin layer and in then polymerising this resin so that the flanks (8a) of the saidopening are sloped; forming a two-layer mask (10a, 12a) on the resin layer partly maskingthe said opening and defining the shape of the pattern to be produced in theferromagnetic layer; anisotropically etching the resin layer so as to remove theunmasked regions of this layer; removing the mask; anisotropically etching theferromagnetic layer (4) whilst using the etched resin layer as etching mask (6a), andremoving the remainder of the resin layer. ……

申请人：COMMISSARIAT A L'ENERGIE ATOMIQUE ETABLISSEMENT DE CARACTERESCIENTIFIQUE TECHNIQUE ET INDUSTRIEL,COMMISSARIAT ENERGIE

ATOMIQUE,COMMISSARIAT A L'ENERGIE ATOMIQUE ETABLISSEMENT DE CARACTERESCIENTIFIQUE TECHNIQUE ET INDUSTRIEL

地址：FR

国籍：FR

代理机构：Signore, Robert

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