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METHOD OF MEASURING IRREGULARITIES IN THE EVENNESS

2023-01-20 来源:爱问旅游网
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专利名称:METHOD OF MEASURING IRREGULARITIES

IN THE EVENNESS OF SURFACES

发明人:JAERISCH; WALTER,MAKOSCH; GUENTER申请号:US27772472申请日:19720803公开号:US3858981A公开日:19750107

摘要:Apparatus and method of measuring surface irregularities by means of theinterference field occurring behind a diffraction grid. Light bars are generated which arereflected from the surface to be tested back onto the grid. If the surface includesirregularities down to 1 micron and under, moire patterns which are a function of theheight and width of the irregularities become visible on the opposite side of the grid. Bysuitably selecting the direction of observation, the moire patterns are superimposed byinterference fringes which permit the moire patterns to be accurately gauged.

申请人:INTERNATIONAL BUSINESS MACHINES CORPORATION

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