Pattern drawing device

专利名称：Pattern drawing device发明人：加藤 正紀,中山 修一申请号：JP2018036163申请日：20180301公开号：JP6583451B2公开日：20191002

摘要：PROBLEM TO BE SOLVED: To provide a pattern drawing device capable of finelycoping with accurate magnification correction.SOLUTION: A pattern drawing device fordrawing a pattern on a substrate with each of a plurality of drawing units that scans aspot light in a main scanning direction on the substrate includes: a light source device foremitting beams LB1 to LB6 that becomes a spot light; a plurality of selection opticalelements AOM1 to 6 that are arranged so as to sequentially pass the beam LB from thelight source device provided corresponding to each of the plurality of drawing units andgenerate a diffraction light beam LB deflected relative to the beam LB during applicationof a driving signal; a relay system (CD1 to 6, CL1 to 6) for forming a beam waist of thebeam LB between two selection optical elements AOM that form a relationship of a frontstage and a back stage in this order by which the beam LB transmits; and branchedreflectors IM1 to 6 that are arranged at a position of the beam waist or a position in theneighborhood thereof and reflect the diffraction light beam LB generated from theselection optical element AOM that is a front stage toward one corresponding drawingunit.SELECTED DRAWING: Figure 6

申请人：株式会社ニコン

地址：東京都港区港南二丁目１５番３号

国籍：JP

代理人：千葉 剛宏,宮寺 利幸,千馬 隆之,大内 秀治,仲宗根 康晴,坂井 志郎,関口 亨祐

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