专利名称：Methods of using optical metrology for
feed back and feed forward process control
发明人：Jeffrey Drue David,Harry Q. Lee,Boguslaw A.
Swedek,Dominic J. Benvegnu,Zhize Zhu,Wen-Chiang Tu
申请号：US12625345申请日：20091124公开号：US08579675B2公开日：20131112
专利附图：
摘要：A method includes polishing a substrate on a first platen using a first set of
parameters, obtaining a plurality of measured spectra from at least two zones,
comparing the plurality of measured spectra with a reference spectrum to evaluate thethickness of each of the at least two zones of the substrate, comparing a thickness of afirst zone with a thickness of a second zone, determining whether the thickness of thefirst zone falls within a predetermined range of the thickness of the second zone, and ifthe thickness does not fall within the predetermined range, at least one of a) adjusting atleast one parameter of the first set and polishing a second substrate on the first platenusing the adjusted parameters, or b) adjusting at least one parameter of a second setand polishing the substrate on a second platen using the adjusted parameters.
申请人：Jeffrey Drue David,Harry Q. Lee,Boguslaw A. Swedek,Dominic J.Benvegnu,Zhize Zhu,Wen-Chiang Tu
地址：San Jose CA US,Los Altos CA US,Cupertino CA US,La Honda CA US,Cupertino CAUS,Mountain View CA US
国籍：US,US,US,US,US,US
代理机构：Fish & Richardson P.C.
更多信息请下载全文后查看
因篇幅问题不能全部显示，请点此查看更多更全内容